Journal of Interfaces, Thin Films, and Low dimensional systems

Controllable synthesis of ZnO nanorods supported by stainless steel mesh for photocatalytic degradation of organic pollutants

Document Type : Original Article

Authors

Department of Physical Chemistry and Nanochemistry, Faculty of Chemistry, Alzahra University, Tehran 19938-93973, Iran.

Abstract

In this research, zinc oxide (ZnO) nanorods were synthesized by the chemical bath deposition (CBD) method on steel mesh 400 for the photocatalytic decomposition of two organic pollutants: methylene blue (MB) dye and tetracycline (TC) antibiotic. Different parameters were studied, including the concentration of the nucleation solution, the number of deposition cycles, and the growth temperature to reach the optimal state of ZnO growth. The optimal sample with a growth time of 3 h at a temperature of 95 °C and a concentration of 5 mM zinc acetate as a nucleation solution was used for photocatalytic degradation tests. The diffuse reflectance spectroscopy (DRS) analysis showed an energy gap of 3.2 eV for ZnO nanorods. The photodegradation rate constants were 0.0121 and 0.0043 min-1 for MB and TC removal, respectively. Also, the mechanism for the photocatalytic degradation was studied to propose the charge generation and transfer pathway.

Keywords

Main Subjects

Article Title [Persian]

سنتز قابل کنترل نانومیله‌های ZnO بر روی زیرلایه مش فولاد ضد زنگ برای تخریب فوتوکاتالیستی آلاینده‌های آلی

Authors [Persian]

  • مرصع صمدی
  • یاسمن آلاوه

گروه شیمی فیزیک و نانوشیمی، دانشکده شیمی، دانشگاه الزهرا، تهران، ایران.

Abstract [Persian]

در این تحقیق، نانومیله‌های اکسید روی (ZnO) با روش رسوب حمام شیمیایی (CBD) بر روی مش فولادی 400 برای تجزیه فوتوکاتالیستی دو آلاینده آلی رنگ متیلن بلو (MB) و آنتی‌بیوتیک تتراسایکلین (TC) سنتز شدند. پارامترهای مختلفی از جمله غلظت محلول هسته‌زایی، تعداد چرخه‌های رسوب‌گذاری و دمای رشد برای رسیدن به حالت بهینه رشد اکسید روی مورد مطالعه قرار گرفتند. نمونه بهینه با زمان رشد 3 ساعت در دمای 95 درجه سانتیگراد و غلظت 5 میلی مولار روی استات به عنوان محلول هسته برای آزمایش های تخریب فوتوکاتالیستی استفاده شد. تجزیه و تحلیل طیف‌سنجی بازتابی منتشر (DRS) شکاف انرژی eV 3.2 را برای نانومیله‌های اکسید روی نشان داد. ثابت‌های سرعت تخریب نوری برای حذف MB و TC به ترتیب 0.0121 و 0.0043 بر دقیقه بود. همچنین، مکانیسم تخریب فوتوکاتالیستی برای پیشنهاد تولید بار و مسیر انتقال مورد مطالعه قرار گرفت.

Keywords [Persian]

  • نیمه هادی
  • نانومیله های اکسید روی
  • فوتوکاتالیست
  • تتراسایکلین
  • متیلن بلو
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Journal of Interfaces, Thin Films, and Low dimensional systems
Volume 7, Issue 2
July 2024
Pages 731-738